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传统磁控溅射技术在有机衬底或有机光电材料上沉积透明导电氧化物阴极薄膜时,荷能粒子轰击有机衬底或有机光电材料会造成衬底或材料的温升和结构损伤,最终影响有机光电器件的性能与寿命,因此实现有机器件中透明导电阴极薄膜的低温低损伤磁控溅射制备过程是一个非常重要的研究课题。本文总结了过去十几年来低温低损伤磁控溅射沉积透明导电薄膜技术的进展,并提出了在确保低温低损伤溅射沉积的前提下,解决薄膜沉积速率较慢、靶材利用率较低和薄膜均匀性较差等问题的途径。探索出一种低温低损伤高速沉积性能优异透明导电薄膜的制备技术,是提高有机光电器件性能的关键。
When magnetron sputtering is used to deposit a transparent conductive oxide cathode film on an organic substrate or an organic photovoltaic material, the charge-up particle bombardment of the organic substrate or the organic photovoltaic material may cause temperature rise and structural damage of the substrate or material, with the final effect Therefore, it is a very important research topic to realize the low-temperature and low-damage magnetron sputtering process of the transparent conductive cathode film in organic devices. This paper summarizes the recent ten years of low temperature damage damage by magnetron sputtering deposition of transparent conductive film technology advances and proposed to ensure low-temperature low-damage sputter deposition under the premise of the solution to the slow deposition rate of the film, the target utilization rate is low And poor uniformity of the film and other issues. It is a key to improve the performance of organic optoelectronic devices by exploring a preparation technique of transparent conductive films with excellent properties of low temperature and low damage and high deposition rate.