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为满足极紫外、软X射线和X射线大口径多层膜反射镜的需求,采用基板扫掠过矩形靶材表面的镀膜方法,在直径120 mm的平面基板上镀制了Mo/Si周期多层膜。通过调整基板扫掠过矩形靶材表面的速率修正了薄膜的沉积速率,极大地提高了薄膜厚度的均匀性。采用X射线衍射仪对反射镜不同位置多层膜周期厚度进行了测量,结果表明,在直径120 mm范围内,Mo/Si多层膜周期厚度的均匀性达到了0.26%。同步辐射测量多层膜样品不同位置处的反射率,结果表明,在直径120 mm范围内,多层膜的膜层厚度均匀,在入射角10°时13.75 nm波长处平均反射率为66.82%。
In order to meet the requirements of extreme ultraviolet, soft X-ray and X-ray large-aperture multilayer mirrors, the substrate was swept over the surface of a rectangular target by a plating method, and the Mo / Si cycle was plated on a flat substrate with a diameter of 120 mm Layer film. By adjusting the rate at which the substrate is swept over the surface of the rectangular target, the deposition rate of the film is corrected, greatly improving the uniformity of the film thickness. The thickness of the multi-layer film at different positions of the mirror was measured by X-ray diffractometer. The results showed that the uniformity of the thickness of the Mo / Si multilayers reached 0.26% within the 120mm diameter. The results of synchrotron radiation reflectance measurements at different locations on the multi-layer film showed that the film thickness of the multi-layer film was uniform over a diameter of 120 mm and the average reflectivity was 66.82% at a wavelength of 13.75 nm at an incident angle of 10 °.