本文对直接从高温石墨室的稳定金属等离子体放电中,引出高束流密度的宽束离子源的设计特点和初步试验进行了介绍。金属蒸气是通过将电子流引入到具有阳极电势的坩埚内,使其中的纯金属蒸发而得到的。当金属蒸气的数量达到能自己维持的程度时,就停止送入用于起动放电的氩气。引出的钛或铜离子束在距离子源50cm处的靶上,束斑直径可达几厘米,束流密度可达几百μA/cm~2。该系统简单、安全、易于保养。 In this paper, the design features and preliminary experiments of a wide beam ion source that emit high beam densities directly from a stable metal plasma discharge at a high temperature graphite chamber are introduced. Metal vapor is obtained by introducing a stream of electrons into a crucible having an anode potential to vaporize the pure metal therein. When the amount of metal vapor reaches the level that can be maintained by itself, the supply of argon gas for starting the discharge is stopped. Lead titanium or copper ion beam at a distance of 50cm from the source of the target beam diameter up to a few centimeters, beam current density up to hundreds of μA / cm ~ 2. The system is simple, safe and easy to maintain.