用射频等离子体化学气相沉积法（ＲＦ－ＣＶＤ）和ＣＨ４、Ｎ２与Ａｒ组成的混合气体制备掺氮类金刚石薄膜（ａ－Ｃ： Ｈ： Ｎ）．用原子力显微镜（ＡＦＭ）、俄歇电子能谱（ＡＥＳ）、红外光谱（ＩＲ）以及显微拉曼谱（Ｍｉｃｒｏ－Ｒａｍａｎ）对 ａ－Ｃ： Ｈ：Ｎ薄膜的表面形貌、组分和微观结构进行表征．实验结果表明，薄膜中有纳米量级的颗粒存在，而且随反应气体 中Ｎ２与ＣＨ４比值的增大，薄膜中的氮元素含量也随之增大，并主要以Ｃ—Ｎ键和Ｎ—Ｈ键形式存在，少量以Ｃ＝Ｎ 键形式存在．Ｎ２的掺入使类金刚石薄膜中Ｃ—Ｈ键含量降低，ＳＰ３成份增加， A nitrogen-doped diamond-like carbon film (a-C: H: N) was prepared by radio frequency plasma chemical vapor deposition (RF-CVD) and a mixed gas of CH4, N2 and Ar. The surface morphology, composition and microstructure of a-C: H: N thin films were characterized by atomic force microscopy (AFM), Auger electron spectroscopy (AES), infrared spectroscopy (IR) and micro Raman spectroscopy Structure is characterized. The experimental results show that there are nano-scale particles in the film, and with the increase of the ratio of N2 to CH4 in the reaction gas, the content of nitrogen element in the film also increases, mainly with C-N bond and N-H Key exists, a small amount of C = N key exists. The incorporation of N2 reduced the content of C-H bonds in diamond-like carbon films and the content of SP3 increased,