对钽表面渗氮的固 气界面反应过程进行了热力学和动力学分析 ,从理论上预测了各种参数 (压力、气体组成、温度、电参数等 )对表面过程的影响 ,并借助于等离子体 ,在较低温度下获得了由表面层与N在Ta中的固溶体组成的表面硬化层。表面层为六方晶系的Ta6N2 ,57和 /或非晶态。通过调整工艺参数有效地抑制了钽表面氧的渗入和Ta2 O5 的形成 ,使得离子渗氮后 ,仍保持较低的表面粗糙度 Thermodynamic and kinetic analysis of solid-gas interface reaction process of nitriding on tantalum surface were carried out. The influence of various parameters (pressure, gas composition, temperature, electrical parameters, etc.) on the surface process was theoretically predicted. By means of plasma , A surface hardened layer composed of a solid solution of a surface layer and N in Ta was obtained at a lower temperature. The surface layers are hexagonal Ta6N2, 57 and / or amorphous. By adjusting the process parameters, the infiltration of tantalum oxygen and the formation of Ta 2 O 5 are effectively suppressed, so that the ion nitriding maintains the low surface roughness