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讨论了采用常规的光刻热熔法及灰度掩模技术制作非梯度折射率型平面折射和平面衍射微透镜的情况。定性地分析了在不同的工艺条件下可能得到的平面端面微光学器件的种类和形貌特征。给出了在石英衬底表面通过光刻热熔工艺和氢离子束蚀刻所得到的球面及圆弧轮廓特征的凹形掩模的SEM照片 ,并对用于近场集成光学头的平面微透镜和半导体激光器的集成结构作了初步分析。利用这一技术所制成的平面折射微透镜可以很方便地与半导体光源等器件匹配耦合及集成固联
The non-gradient refractive index planar refraction and planar diffractive micro-lens fabrication using conventional lithography hot-melting and grayscale masking techniques is discussed. The types and topographies of planar end-face micro-optical devices that can be obtained under different process conditions are qualitatively analyzed. A SEM photograph of a concave mask with spherical and circular contour features obtained by photolithography and hot-melt etching and hydrogen ion beam etching on the surface of a quartz substrate is given. The planar micro-lens for near-field integrated optical head And semiconductor laser integrated structure made a preliminary analysis. Using this technology made of flat refraction micro-lens can be easily coupled with the semiconductor light source and other devices coupled and integrated solid couplet