由于离子轰击技术的广泛应用,对其渗层的精细结构的研究也日益深入,但是,对于离子轰击渗层中晶体缺陷的形成机制和界面结构尚不清楚.作者发现离子轰击渗氮层中有大量的空位和各种缺陷,本文首次采用高分辨电子显微镜(HRTEM)获得了离子轰击渗氮层各相的高分辨结构图象和界面结构原子象,在原子尺度上揭示了渗层中各相的结构和界面结构.1 实验 Due to the extensive application of ion bombardment technology, the study on the fine structure of its infiltrating layer is also increasingly in-depth, but the formation mechanism and interfacial structure of the crystal defects in the ion bombardment layer are still unclear.It is found in the ion bombardment nitriding layer A large number of vacancies and various defects, this paper for the first time using high resolution electron microscopy (HRTEM) obtained ion bombardment nitriding phase of the high resolution image and interface structure of atomic images revealed in the atomic layer of each phase Structure and interface structure .1 experiments