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在同一次双靶共溅射过程中,通过改变基体相对于靶材的位置制备了不同化学成份TiAl系金属间化合物薄膜。采用EDS、XRD、SEM、AFM等手段对薄膜的成分、物相结构和表面形貌进行了表征,并对薄膜的高温摩擦行为进行了分析研究。实验结果表明:薄膜的化学成分、物相结构、表面形貌都随着溅射位置的改变而发生变化,500℃以下时位于双靶中间位置的薄膜具有体系中最佳的性能。
In the same double-target co-sputtering process, TiAl-based intermetallic compound films with different chemical compositions were prepared by changing the position of the substrate relative to the target. The composition, phase structure and surface morphology of the films were characterized by EDS, XRD, SEM and AFM, and the high temperature friction behaviors of the films were analyzed. The experimental results show that the chemical composition, phase structure and surface morphology of the films all change with the change of sputtering position. The films located at the middle of two targets below 500 ℃ have the best performance in the system.