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本文从择优取向材料的受力边界条件出发．提出了一种计算择优取向材料X射线弹。性质的近似模型─—加权Hill模型并用这一简化模型计算了一些模型材料的X射线应力测试曲线．为验证新模型，实测了电镀及电刷镀Cu膜的应力实验结果与用新模型计算结果符合得较好从而解释了等离子辅助化学气相沉积（PCVD）TiN膜应力测试曲线的低ψ角弯曲现象．指出这种弯曲是由PCVDTIN中存在的柱状晶定向排列引起当低ψ角弯曲而高ψ角具有线性区段时、可利用高角直线段的斜率计算残余应力
This paper starts from the force boundary conditions of preferred orientation materials. A new method to calculate the preferred orientation material X-ray projectile was proposed. The approximate model of the property ─ ─ weighted Hill model and calculated using a simplified model of some of the model materials X-ray stress test curve. In order to verify the new model, the experimental results of stress measurement of electroplating and brush-plating of Cu film are in good agreement with the results of new model calculation, which explains the low ψ angle bending of stress-test curve of TiCN film by plasma assisted chemical vapor deposition (PCVD) . It is pointed out that this bending is caused by the orientation of columnar crystals existing in PCVDTIN. When the low ψ angle is bent and the high ψ angle has a linear section, the slope of the high-angle straight section can be used to calculate the residual stress