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采用黏性激波层基本方程组对有无泰氟龙烧蚀两种情况下的钝锥体化学非平衡绕流作了数值求解,以研究泰氟龙烧蚀对流场电子密度的影响规律.算例结果表明:泰氟龙烧蚀确有降低流场电子密度的效应.平衡催化壁工况下这种效应的强度,显著大于非催化壁工况下的强度;远下游截面处的这种效应的强度,显著大于驻点区的强度.此外,通过计算结果分析,对形成上述影响规律的原因作了初步讨论.
The basic equations of viscous shock wave were used to numerically solve the chemical unbalanced flow around the blunt cone in the presence or absence of Teflon ablation to study the influence of the Teflon ablation on the electron density of the flow field The experimental results show that the ablation of Teflon does have the effect of reducing the electron density of the flow field.The strength of this effect under the balanced catalytic wall condition is significantly greater than that under the non-catalytic wall condition. The intensity of the seed effect is significantly greater than that of the stagnation zone. In addition, the reasons for the formation of the above-mentioned impact are discussed preliminarily through the analysis of the calculation results.