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有关片状磷源扩散性能,以及在器件扩散工艺中应用情况,国内外已有不少文章报导。虽然这种扩散源工艺上还存在不足之处,但已被公认为是一种有发展前途的新型磷扩散源。我组曾试用过国产SP-2片状磷源,针对扩散工艺对磷源的基本要求,对源片的扩散情况,扩散工艺的均匀性、重复性;在p型衬底上扩磷后的p-n结特性等方面,已作过讨论和总结。本文着重试验高浓度SP-3片状磷源的扩散性能,以获得一些扩散试验数据,希望能对此源作器件的高浓度磷扩散时提供参考。
About the flaky P source diffusion performance, as well as the application of the device diffusion process, many articles have been reported at home and abroad. Although there are still some shortcomings in this diffusion source technology, it has been recognized as a promising source of phosphorus diffusion. Our group has tried homemade SP-2 flaky phosphorus source, according to the basic requirements of the phosphorus source for the diffusion process, the diffusion of the source sheet, the uniformity and repeatability of the diffusion process; after the phosphorus is added on the p-type substrate pn junction characteristics, etc., have been discussed and concluded. In this paper, the diffusion properties of high concentration SP-3 flake-type phosphorus sources are emphatically tested to obtain some diffusion test data. It is hoped that this source can be used as a reference for the diffusion of high-concentration phosphorous in this device.