采用由普通炸药爆轰制备的金刚石纳米粉对光滑硅衬底进行了涂覆预处理，研究了金刚石薄膜经徐覆和研磨预处理的两种衬底上的生长行为及其演化过程．结果表明，纳米粉处理能在显著提高成核密度的同时，大大缩短长成连续膜所用的时间；薄膜的生长由前后相继的两个阶段所构成，即确定晶面形成前球状颗粒的成长与融合和晶面的逐渐显露与晶粒长大过程．经足够长的生长时间后，所得薄膜具有结构致密、晶面清晰、晶形完整和表面平整度高的特征，特别适合于高致密性自支持薄膜的生长．而研磨处理衬底上生长的薄膜一旦成核，便有确定晶面的显露，但却出现明显的二次成核和孪晶，所得薄膜的致密性与表面平整度均不及徐覆处理的好．文中还对结果进行了简要讨论． The smooth silicon substrate was coated and pretreated with diamond nanopowder detonated by ordinary explosives. The growth behavior and evolution of diamond films on two kinds of substrates pretreated by X - covered and grinding were studied. The results show that the nano-powder treatment can significantly improve the nucleation density, while shortening the time it takes to form a continuous film. The growth of the film consists of two successive phases: the growth of the spherical particles Fusion and the gradual emergence of crystal face and grain growth process. After a long enough growth time, the obtained film has the characteristics of compact structure, clear crystal face, complete crystal shape and high surface flatness, especially suitable for the growth of high density self-supporting film. However, once the film grown on the substrate is nucleated, the exposed crystal surface is confirmed, but the obvious secondary nucleation and twins appear, and the compactness and surface flatness of the obtained film are not as good as that of the XUO coating . The article also briefly discussed the results.