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光刻胶是纳米压印的关键材料,其性能将影响压印图形复制精度、图形缺陷率和图形向底材转移时刻蚀选择性。提出了成膜性能、硬度黏度、固化速度、界面性质和抗刻蚀能力等压印光刻胶的性能指标。并根据工艺特点和材料成分对光刻胶分类,介绍了热压印光刻胶、紫外压印光刻胶、步进压印式光刻胶和滚动压印式光刻胶的特点以及碳氧类纯有机材料、有机氟材料、有机硅材料做压印光刻胶的优缺点。列举了热压印、紫外压印、步进压印工艺中具有代表性的光刻胶实例,详细分析了其配方中各组分的比例和作用。介绍了可降解光刻胶的原理。展望了压印光刻胶的发展趋势。
Photoresists are the key materials for nanoimprint, and their properties will affect the imprint pattern replication accuracy, the pattern defect rate and etch selectivity when the pattern is transferred to the substrate. Proposed film properties, hardness viscosity, curing speed, interface properties and anti-etching ability of imprint lithography performance index. And according to the process characteristics and material composition of the photoresist classification, introduces the hot embossing resist, UV embossing resist, step embossing resist and rolling embossing resist features and carbon and oxygen Class Pure organic materials, organic fluorine materials, silicone materials do imprint photoresist advantages and disadvantages. The typical examples of photoresists in hot embossing, UV embossing and step imprinting are listed. The proportions and functions of each component in the recipe are analyzed in detail. The principle of biodegradable photoresist is introduced. Prospects for the development trend of imprint resist.