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采用大功率、高重复频率、准分子激光溅射热解石墨靶制备了类金刚石膜,研究了直流辉光氢等离子体处理对类金刚石膜的场发射性能的影响。结果表明:氢等离子体处理后,类金刚石膜的场发射性能明显提高,其发射阈值电场由26V/μm下降到19V/μm。氢等离子体刻蚀除去了类金刚石膜生长表面的富含石墨的薄层,露出的新表面具有较低的功函数;膜表面的悬键被氢原子饱和,进一步降低了电子亲和势,改善了膜的场发射性能。
DLC films were prepared by pyrolytic graphite target with high power, high repetition rate and excimer laser sputtering. The effects of DC plasma treatment on the field emission properties of DLC films were investigated. The results show that after hydrogen plasma treatment, the field emission properties of diamond-like carbon films are obviously improved, and the emission threshold electric field decreases from 26V / μm to 19V / μm. Hydrogen plasma etching removes the graphite-rich layer of the diamond-like growth surface and exposes a new surface with a lower work function; the dangling bonds on the membrane surface are saturated with hydrogen atoms, further reducing the electron affinity and improving The field emission performance of the membrane.