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主要研究了减压法制备 Ｔ Ｉ Ｏ２ 薄膜过程中氧气及水的变化对薄膜沉积率的影响； 对 Ｔ Ｉ Ｏ２ 薄膜生长反应动力学进行了研究。为制备优制 Ｔ Ｉ Ｏ２ 薄膜奠定了基础。
The effects of oxygen and water changes on the film deposition rate were investigated. The kinetics of T I O2 growth was studied. The preparation of excellent T I O2 film laid the foundation.