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采用溶胶-凝胶法以提拉的方式在普通玻璃基底上制备出ZnO:Al(AZO)薄膜。通过X射线衍射仪、场发射扫描电子显微镜、方块电阻测试仪、Hall效应测试仪、紫外-可见-红外分光光度计研究了薄膜物相、微观结构、光电性能;分析了不同热处理方式对于薄膜光电性能的影响。结果表明:经10次提拉所制备薄膜可见光透过率85%左右。热处理工艺的选择对于提升AZO薄膜的电学性能至关重要,相比于空气气氛和真空下的热处理,采用具有还原性的5%H_2和95%N_2的混合气氛热处理得到了具有最好电学性能的AZO薄膜。在550℃还原气氛下保温60 min得到薄膜方块电阻约为300Ω/□,电阻率约为3.3×10~(-3)Ω·cm。
ZnO: Al (AZO) thin films were prepared on a common glass substrate by sol-gel method. The phase, microstructure and optical properties of the films were investigated by X-ray diffraction, field emission scanning electron microscopy, square resistance tester, Hall effect tester and UV-Vis-IR spectrophotometer. The effects of different heat treatment methods The impact of performance. The results show that the visible light transmittance of the film prepared by pulling for 10 times is about 85%. The choice of heat treatment process is essential to improve the electrical properties of the AZO thin film. Compared with the heat treatment in air atmosphere and vacuum, the heat treatment with mixed atmosphere of reducing 5% H 2 and 95% N 2 has the best electrical properties AZO film. The sheet resistance was about 300Ω / □ and the resistivity was about 3.3 × 10 ~ (-3) Ω · cm when incubated in a reducing atmosphere at 550 ℃ for 60 min.