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在托卡马克偏滤器区域充入杂质气体是检验偏滤器杂质屏蔽效应的重要手段。利用快速极紫外EUV光谱仪对EAST托克马克装置上开展的偏滤器Ar杂质注入实验进行观测。结合NIST原子光谱数据库对2~50 nm范围内不同电离态Ar的线光谱进行了谱线识别,识别出ArⅣ,ArⅨ-Ⅺ,Ar XⅣ-XⅥ等若干个电离态的谱线。为了同时观测等离子体不同区域的Ar杂质行为,在杂质注入实验时重点监测Ar XⅥ35.39 nm(Ar XⅥ电离能918.4 eV,主要分布在等离子体芯部)和ArⅣ44.22 nm(ArⅣ电离能9.6 eV,主要分布在等离子体边界)这两条谱线。利用该两条谱线强度随时间演化的结果初步分析了偏滤器杂质屏蔽效应。在同一充气口不同等离子体位形下的实验结果表明偏滤器对于从偏滤器区域注入Ar杂质的屏蔽效果优于从主等离子体区域注入,并且下偏滤器及内冷泵的综合粒子排除能力优于上偏滤器。
Filling the tokamak divertor area with the impurity gas is an important measure to check the divertor impurity shielding effect. A rapid EUV EUV spectrometer was used to observe the impurity implantation of divertor Ar on the EAST Tokemark device. Combined with the NIST atomic spectroscopy database, the line spectra of different ionized Ar spectra in the range of 2 ~ 50 nm were identified, and several ionization spectra such as ArⅣ, ArIX-Ⅺ and Ar XⅣ-XⅥ were identified. In order to observe the behavior of Ar impurities in different regions of the plasma at the same time, Ar X Ⅵ 35.39 nm (Ar X Ⅵ ionization energy 918.4 eV, mainly distributed in the plasma core) and Ar Ⅳ 44.22 nm (Ar Ⅳ ionization energy 9.6 eV, mainly distributed at the plasma boundary) these two lines. The impurity screening effect of the divertor filter was preliminarily analyzed by using the results of the evolution of the two line intensities with time. Experimental results at different plasma configurations on the same air inlet show that the divertor has better shielding effect on Ar impurities implanted from the divertor region than from the main plasma region and the combined particle exclusion ability of the divertor and internal coolant pump is superior to Upper diverter.