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本文对红外光学材料锗的蚀刻性能、机制进行了深入的研究，在反应离子蚀刻（ＲＩＥ）实验基础上，建立了锗材料蚀刻性能与ＲＩＥ工艺参量的关系，经过大量的实验，找到了稳定蚀刻速率的方法和条件，为用ＲＩＥ技术形成高精度衍射微光学元件积累了实用经验
In this paper, the etching performance and mechanism of infrared optical material germanium have been studied deeply. Based on the RIE experiment, the relationship between the etching performance of germanium material and RIE process parameters has been established. After a large number of experiments, stable etching Rate methods and conditions for the use of RIE technology to form high-precision diffraction micro-optical element has accumulated practical experience