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采用直流磁控溅射方法制备了不同调制比的Ni/Al纳米多层膜,利用X射线衍射技术和纳米压入连续刚度法分析了薄膜微结构及塑性变形的尺度依赖性.实验结果表明,尽管调制比有所不同,多层膜的硬度与“软”相的微结构特征参量随调制波长减小具有相似变化规律,说明多层膜的变形机制对“软”相的微结构约束存在敏感性.随着薄膜特征尺度的减小,为统一多层膜中晶界和膜界两种强化机制,提出一个与“软”相相关的表征参量r(r=Lsub/d,Lsub表示亚层厚,d表示晶粒尺寸),这使得薄膜变形在整个尺度范围内均符合Hall-Petch关系.
Ni / Al nano-multilayer films with different modulation ratios were prepared by DC magnetron sputtering method, and the scale dependence of the microstructure and plastic deformation of the films was analyzed by X-ray diffraction and Nano-in continuous stiffness method.The experimental results show that, Although the modulation ratio is different, the multilayer film hardness and the microstructure characteristic parameters of “soft” phase have similar variation rules with the decreasing of the modulation wavelength, which shows that the deformation mechanism of the multi-layer film is sensitive to the “soft” With the reduction of the characteristic scale of the thin film, a characterization parameter r (r = Lsub) related to the “soft” phase is proposed to unify the two kinds of strengthening mechanisms in the grain boundary and the film boundary. / d, Lsub is the sublayer thickness, and d is the grain size), which makes the deformation of the film conform to the Hall-Petch relationship over the entire scale.