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以3-(2,3-环氧丙氧)丙基三甲氧基硅烷(GPMS)作为连接层,在单晶硅基底表面制备2,5-呋喃二酮与1-十八烯的共聚物(PMAO)聚合物薄膜.采用傅立叶变换红外光谱仪及原子力显微镜表征薄膜的结构,分别从微观和宏观摩擦学角度考察薄膜的摩擦磨损性能.结果表明:PMAO聚合物通过环氧硅烷分子与基底之间形成化学吸附,GPMS增强了聚合物/无机界面间的粘附性和稳定性;与空白基底相比,聚合物薄膜具有低摩擦系数和优异的抗磨性能,可以作为低载荷下硅基材料的抗磨减摩防护层.
A copolymer of 2,5-furandione and 1-octadecene was prepared on the surface of a monocrystalline silicon substrate using 3- (2,3-epoxypropoxy) propyltrimethoxysilane (GPMS) as a tie layer (PMAO) polymer films were prepared by means of Fourier transform infrared spectroscopy and atomic force microscopy, respectively.The friction and wear properties of the films were investigated microscopically and macroscopically in terms of tribology.The results showed that the PMAO polymer was formed between epoxy silane molecules and the substrate Chemisorption, GPMS enhances the adhesion / stability between the polymer / inorganic interface; Compared with the blank substrate, the polymer film has a low friction coefficient and excellent anti-wear properties, which can be used as a low-load silicon-based material Anti-friction wear protective layer.