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针对内线转移CCD金属铝遮光技术存在的漏光问题,对比了不同难熔金属材料的遮光性能,选择漏光率较低的氮化钛金属作为新型遮光层材料。研究了不同气体配比、不同射频功率和腔体压力对氮化钛刻蚀选择比、条宽控制等参数的影响。通过优化工艺参数,获得了适合于刻蚀氮化钛遮光层的工艺条件。
In view of the light leakage problem existing in the internal transfer CCD metal aluminum shading technology, the light shielding performance of different refractory metal materials is compared, and the titanium nitride metal with lower light leakage rate is selected as the new light shading material. The effect of different gas ratio, different RF power and cavity pressure on titanium nitride etching selectivity ratio and strip width control were studied. By optimizing the process parameters, the process conditions suitable for etching the titanium nitride light-shielding layer were obtained.