纯铝中杂质的光谱分析,一般灵敏度为1×10~(-3)—1×10~(-2)％。采用化学分离富集的化学光谱法虽可把灵敏度提高到5×10~(-6)—1×10~(-2)％,但因溶样困难和试剂空白高等,高纯氧化铝采用这种方法分析是困难的。有人用蒸发光谱法测定氧化铝中杂质,灵敏度较高,但需一套特殊的蒸发设备,且只能分析Cd、Bi、Sb、Pb,Sn、Cu等较易挥发的元素。为寻找一种简便灵敏的直接光谱法,研究了谱线在直流电弧中的轴向强度分布,并拟定了一个阴极激发,阴极区照相 Spectral analysis of impurities in pure aluminum, the general sensitivity of 1 × 10 ~ (-3) -1 × 10 -2%. The chemical separation and enrichment of chemical spectroscopy although the sensitivity can be increased to 5 × 10 -6 -6 -1 × 10 -2%, but due to the difficulties of sample dissolution and high reagent blank, high purity alumina using this Methodological analysis is difficult. Some people use evaporative spectrometry to measure the impurities in alumina with higher sensitivity. However, it needs a special evaporation equipment and can only analyze the more volatile elements such as Cd, Bi, Sb, Pb, Sn and Cu. In order to find a simple and sensitive method of direct spectroscopy, the axial intensity distribution of the line in DC arc was studied and a cathodic excitation and cathodic region photography