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采用中频孪生靶反应磁控溅射在金属镍基底上制备氮化铬薄膜。利用X射线衍射仪、显微硬度计、扫描电子显微镜、原子力显微镜、磨擦磨损试验仪和电化学工作站等系统研究了氮气流量(即氮/氩流量比)对薄膜的相结构、显微硬度、表面形貌、附着力、耐磨性和耐腐蚀性的影响。结果得到随氮/氩流量比的增加,CrN_x薄膜成分经历了一个由Cr→Cr+Cr N→Cr+Cr_2N+Cr N的演化过程,薄膜形貌由致密、球状颗粒向类长方体规则形状的面心结构转化;而薄膜的表面粗糙度则呈现出在低氮时稍微下降,高氮含量时又快速增加的趋势,在N_2/Ar流量比为23/53时,粗糙度达到最小;耐磨性、硬度都呈现随着氮流量的增加先上升后下降;薄膜耐腐蚀性能随氮的加入明显得到改善。综合性能分析认为,制备2.5μm厚的氮化铬薄膜时在N_2/Ar(流量比)为23/53较为合适。
Preparation of Chromium Nitride Thin Films on Metallic Nickel Substrates by Middle Frequency Twin Target Reactive Magnetron Sputtering. The effects of nitrogen flow rate (ie, nitrogen / argon flow ratio) on the phase structure, microhardness, hardness and mechanical properties of the films were investigated by XRD, microhardness tester, scanning electron microscopy, atomic force microscopy, abrasion tester and electrochemical workstation. Surface morphology, adhesion, abrasion resistance and corrosion resistance. The results show that the composition of CrN_x thin films undergoes an evolution from Cr → Cr + Cr N → Cr + Cr 2 N + Cr N with the increase of the ratio of nitrogen / argon flux. The morphology of the films is composed of dense, But the surface roughness of the film shows a slight decrease at low nitrogen and a rapid increase at high nitrogen content. The roughness reaches the minimum when the N 2 / Ar ratio is 23/53. The wear resistance , The hardness of the films first increases and then decreases with the increase of the nitrogen flow rate. The corrosion resistance of the films is obviously improved with the addition of nitrogen. Comprehensive performance analysis, the preparation of 2.5μm thick chromium nitride film N_2 / Ar (flow ratio) of 23/53 is more appropriate.