采用时域有限差分(FDTD)法研究了金膜厚度、电介质折射率及其厚度对金孔阵列-电介质与金-电介质孔阵列两种结构强透射特性的影响。研究发现这两种结构都具有较好的强透射特性,这表明光与金膜表面自由电子的电荷密度波耦合成表面等离子激元(SPP),对增强透射起到了关键作用。金膜厚度是影响强透射特性的主要因素,其衰减长度为35nm;而与金膜相邻的电介质膜厚度对强透射特性影响极小。电介质折射率大小对强透射特性影响明显,折射率为1.8时能够获得较好的强透射特性。 The effects of gold film thickness, dielectric refractive index and thickness on the strong transmission characteristics of two kinds of gold-hole array-dielectrics and gold-dielectric hole arrays were studied by FDTD method. The results show that both of these structures have good strong transmission, indicating that the charge density wave coupling of light with the free electrons on the gold film surface is a surface plasmon polariton (SPP), which plays a key role in enhancing transmission. The thickness of the gold film is the main factor that affects the strong transmission characteristics, and the attenuation length is 35 nm. The thickness of the dielectric film adjacent to the gold film has little effect on the strong transmission characteristics. The size of the dielectric refractive index has a strong influence on the strong transmission characteristics. When the refractive index is 1.8, good transmission characteristics can be obtained.