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本文研究了过氧化氢(H2O2)抛光液体系中金属钌的化学机械抛光行为,采用电化学分析方法和X射线光电子能谱仪(XPS)分析了氧化剂和络合剂对腐蚀效果的影响,利用原子力显微镜(AFM)观察抛光表面的微观形貌.结果表明:在过氧化氢抛光液体系中,金属钌表面钝化膜的致密度和厚度与醋酸(CH3COOH)和H2O2的浓度有关.抛光液中醋酸主要通过促进阳极反应的进行从而增强抛光液对金属钌的化学作用,CH3COOH作为络合剂比三乙醇胺(TEA)或酒石酸(C4H6O6)得到的抛光速率更高.低浓度H2O2通过增强抛光液对金属钌的化学腐蚀,抛光速率增大,较高浓度H2O2可能通过在金属表面形成较厚的氧化膜,抛光速率下降.XPS图谱说明钌片浸泡在含醋酸介质过氧化氢体系抛光液后,钌、氧原子相对含量之比约为2∶3,而且金属钌被氧化到四价和八价,这可能是因为金属钌表面生成RuO2和RuO4.抛光后的金属钌表面在5μm×5μm范围内平均粗糙度Sa由抛光前的33 nm降至6.99 nm.
In this paper, the chemical mechanical polishing of ruthenium metal in hydrogen peroxide (H2O2) polishing liquid system was studied. The effects of oxidant and complexing agent on corrosion were analyzed by electrochemical analysis and X-ray photoelectron spectroscopy (XPS) Atomic force microscope (AFM) was used to observe the microstructure of the polished surface.The results showed that the density and thickness of passivation film on ruthenium metal surface were related to the concentration of acetic acid (CH3COOH) and H2O2 in the polishing solution Acetic acid enhances the chemical action of the polishing solution on the metal ruthenium mainly by promoting the progress of the anode reaction, and the polishing rate of CH3COOH as the complexing agent is higher than that of the triethanolamine (TEA) or tartaric acid (C4H6O6) Ruthenium chemical corrosion, the polishing rate increases, the higher concentration of H2O2 may be formed by thicker oxide film on the metal surface, the polishing rate decreased.XPS map shows the ruthenium sheet immersed in acetic acid medium hydrogen peroxide system polishing solution, ruthenium , The ratio of the relative content of oxygen atoms is about 2: 3, and the ruthenium metal is oxidized to tetravalent and octavalent, probably because RuO2 and RuO4 are formed on the ruthenium metal surface. Plane in the range of 5μm × 5μm mean roughness Sa of 33 nm before polishing down to 6.99 nm.