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PECVD SiN膜在半导体器件表面钝化推广应用中,采用一种SiO-SiN双重结构形式.本文介绍了有关的试验数据、理论分析以及实际应用.
PECVD SiN film in the semiconductor device surface passivation applications, the use of a SiO-SiN dual structure.This paper describes the relevant experimental data, theoretical analysis and practical application.