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借助于Mott-Schottky方程分析了成膜电位、成膜时间、成膜温度以及氯离子等因素对22Cr双相不锈钢在碳酸氢钠/碳酸钠缓冲溶液中所成钝化膜半导体性能的影响,同时借助于X射线光电子能谱(XPS)技术分析了所成钝化膜的组成.结果表明:22Cr双相不锈钢在碳酸氢钠/碳酸钠缓冲溶液中所成钝化膜呈n-p型半导体结构,钝化膜内施主/受主密度随成膜电位增加、成膜时间延长、成膜温度降低、以及介质中氯离子浓度的降低而减小,同时膜对基体保护作用随这些因素变化而增强.钝化膜的XPS分析表明,钝化膜呈现双层结构,外层膜主要由三价铁的氧化物(Fe2O3)组成,内层膜主要由三价铬氧化物(Cr2O3)以及少量二价铁氧化物(FeO)组成.
The influence of film formation potential, film formation time, film formation temperature and chloride ion on the semiconductor properties of passivation film of 22Cr duplex stainless steel in sodium bicarbonate / sodium carbonate buffer solution was analyzed by means of Mott-Schottky equation. The composition of passivating film was analyzed by means of X-ray photoelectron spectroscopy (XPS). The results show that the passivating film of 22Cr duplex stainless steel in sodium bicarbonate / sodium carbonate buffer solution has np type semiconductor structure, The donor / acceptor density in the film increases with the increase of the film formation potential, the film formation time, the film formation temperature and the decrease of the chloride ion concentration in the medium, and the protective effect of the film on the matrix increases with these factors. XPS analysis of the film showed that the passivation film has a double-layer structure, the outer film mainly consists of ferric oxide (Fe2O3), the inner film is mainly composed of trivalent chromium oxide (Cr2O3) and a small amount of ferrous iron Material (FeO) composition.