深蚀刻二元光学元件制作误差模拟

来源 :中国激光 | 被引量 : 0次 | 上传用户:icetqq
下载到本地 , 更方便阅读
声明 : 本文档内容版权归属内容提供方 , 如果您对本文有版权争议 , 可与客服联系进行内容授权或下架
论文部分内容阅读
用计算机研究并给出了深蚀刻二元光学元件制作误差对衍射效率影响的规律;将深刻蚀二元光学元件与一般二元光学元件制作误差规律的不同之处进行了分析说明;提出了深刻蚀二元光学元件制作误差规律的经验公式 The law of the influence of fabrication error of deep-etched binary optical element on the diffraction efficiency was studied and given by computer. The differences between the errors of fabrication of deep-etched binary optical element and general binary optical element were analyzed and explained. Experience formula of error of etching binary optical components
其他文献
Whose clothes are these?