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钨由于高熔点、低溅射率等优点而被广泛的认为是最有希望的核聚变装置面对等离子体材料。然而考虑到等离子体约束和边界气体再循环,钨涂层面对等离子体材料在真空中的出气性能的研究是十分重要的。研究结果显示钨涂层主要出气种类为H2,H2O,O2,CO/N2和CO2。在300℃、经过4小时的烘烤,涂层出气率有明显的降低,特别是H2O和CO/N2;继续烘烤对涂层出气率改善效果不显著,因此真空等离子体喷涂钨涂层在用作面对等离子体材料时,仍需要烘烤、放电清洗等壁处理手段。
Due to its high melting point and low sputtering rate, tungsten is widely regarded as the most promising fusion device facing plasma materials. However, considering the plasma confinement and boundary gas recirculation, it is very important that the tungsten coating is facing outgassing performance of plasma materials in vacuum. The results show that the main types of tungsten coatings are H2, H2O, O2, CO / N2 and CO2. At 300 ℃, after 4 hours of baking, the gas-out rate of the coating decreased obviously, especially that of H2O and CO / N2. The effect of continuous baking on the gas-out rate of the coating was not significant, so the vacuum plasma spraying tungsten coating Used to face the plasma material, still need to bake, discharge cleaning and other wall treatment.