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描述了两种典型准分子激光 (XeCl:30 8nm ,30ns和ArF :193nm ,17ns)对三种常用聚合物PC ,PI和PMMA的刻蚀实验研究。着重讨论准分子激光对聚合物的刻蚀机制 ,并比较了这两种激光对三种聚合物的刻蚀性能。
The etching experiments on three commonly used polymer PC, PI and PMMA are described by two typical excimer lasers (XeCl: 30 8nm, 30ns and ArF: 193nm, 17ns). Focusing on the excimer laser etching mechanism of the polymer, and compared the two laser etching properties of the three polymers.