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本文探讨了硅台面结构凸角腐蚀的原因。指出非理想的直角掩膜结构导致了凸角腐蚀,凸角处侧壁由横向腐蚀速率最快的晶面所构成。
This article explores the reasons for corrosion of the silicon mesa structure lobe. It is pointed out that the non-ideal rectangular mask structure leads to the corrosion of the lobe, and the sidewall of the lobe is formed by the crystal plane with the fastest lateral corrosion rate.