【摘 要】
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In this paper, the optical characteristics of new type hemispherical grid subwavelength grating are studied by using multi-level column structure approximation
【机 构】
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State Key Laboratory on High Power Semiconductor Lasers,State Key Laboratory of Applied Optics
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In this paper, the optical characteristics of new type hemispherical grid subwavelength grating are studied by using multi-level column structure approximation and rigorous coupled-wave analysis. This kind of grating could be fabricated by chemical methods, thus simplifying the fabrication technology of subwavelength gratings for visible light. By computer simulation and calculation, the hemispherical grid subwavelength gratings are proved to have antireflective characteristics. Two design schemes of this kind of grating are presented. In the first scheme, the grating could achieve a reflectivity as low as 3.4416×10-7, which can be adapted to 0.46―0.7 μm of visible waveband and ±12° incident angle field. In the second scheme, the grating can achieve a reflectivity as low as 3.112×10-4 and adapted to the whole visible waveband and ±23° incident angle field. The application field of the latter scheme is wider than that of the former. The results of this paper could provide reference for the applications of the hemispherical grid subwavelength gratings for the visible waveband.
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