电流密度影响下镍钨合金电沉积层的组成、结构和形貌

来源 :厦门大学学报(自然科学版) | 被引量 : 0次 | 上传用户:qin6668
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采用分光光度法、X射线衍射和金相显微镜等方法研究在焦磷酸盐体系中,电流密度影响下所获得的Ni-W合金电沉积层的组成、结构和表面形态.结果表明,随着电流密度的提高,合金沉积层中的W含量增大;形成置换固溶体的合金沉积层晶格参数涨大、晶格畸变度增大、而显微晶粒尺寸减小;合金沉积层的电结晶生长形态均呈现整齐的团粒状生长特征.讨论了上述实验结果. The composition, structure and surface morphology of electrodeposited Ni-W alloy electrodeposited in the pyrophosphate system under current density were investigated by spectrophotometry, X-ray diffraction and metallographic microscope. The results show that with the increase of current density, the content of W in the deposited layer increases. The lattice parameter of the deposited layer forming the substitutional solid solution increases, the lattice distortion increases and the grain size decreases. The alloy The electrical crystal growth morphology of the sediments showed neat aggregate growth characteristics. The above experimental results are discussed.
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