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以CF4和C6H6的混合气体作为气源 ,在微波电子回旋共振化学气相沉积 (ECR CVD)装置中制备了氟化非晶碳薄膜 (a C :F) ,并在N2 气氛中作了退火处理以考察其热稳定性 .通过傅里叶变换红外吸收谱和紫外 可见光谱获得了薄膜中CC双键的相对含量和光学带隙 ,发现膜中CC键含量与光学带隙之间存在着密切的关联 ,在高微波功率下沉积的氟化非晶碳膜具有低的光学带隙和较好的热稳定性 .
A fluorinated amorphous carbon film (a C: F) was prepared in a microwave electron cyclotron resonance chemical vapor deposition (ECR CVD) apparatus using a mixed gas of CF4 and C6H6 as a gas source and annealed in an atmosphere of N2 The thermal stability of the films was investigated by Fourier transform infrared spectroscopy and UV-vis spectra.The relative CC content and optical band gap in the film were obtained and it was found that there was a close correlation between CC bond content and optical band gap , The fluorinated amorphous carbon film deposited under high microwave power has low optical band gap and better thermal stability.