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尽管有很多模型对平面磁控溅射膜厚分布进行了模拟，但对大面积曲面如半球形的头罩膜厚分布的模拟则没有涉及。本文根据磁控溅射球冠形基片上膜厚分布规律出发，分析了几个可能实现头罩均匀镀膜的模型，并对不同的模型进行了计算机模拟，找出了实现头罩均匀镀膜的最佳方式，并得到了实验验证。
Although many models have been used to simulate the thickness distribution of planar magnetron sputtering, the simulation of the film thickness distribution of a large area curved surface, such as a hemispherical mask, is not covered. In this paper, according to the rule of film thickness distribution on a magnetron sputtering spherical cap substrate, several models of uniform coating of the hood are analyzed. The computer simulation of different models is carried out to find out the most uniform coating of the hood Good way, and has been experimentally verified.