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利用非平衡磁控溅射物理气相沉积技术制备了光滑、致密、均匀的类金刚石薄膜.分析沉积工艺参数对所得类金刚石薄膜的电学特性的影响以及溅射粒子的大小、能量、碰撞及沉积过程中的相变机理后认为溅射粒子越小、与环境气体分子的碰撞次数越多、与衬底相互作用时具有适当动量等,能够有效提高薄膜中sp3杂化碳原子的含量.利用拉曼光谱、纳米力学探针、红外光谱、扫描电镜等分析了所得类金刚石膜的结构、力学及光学性能、表面形貌等特征.结果表明,类金刚石膜中sp3杂化碳原子的含量较高,显微硬度大于11GPa,薄膜光学透过率达到89·4%,折射系数为1·952,沉积速率为0·724μm/h,表面光滑、致密、均匀,不存在明显的晶粒特征.
A smooth, dense and uniform diamond-like carbon film was prepared by unbalanced magnetron sputtering physical vapor deposition technique.The effects of deposition parameters on the electrical properties of the obtained diamond-like carbon films and the size, energy, collision and deposition of sputtered particles In the phase transition mechanism that the smaller the sputtered particles, the number of collisions with the ambient gas molecules with the substrate interaction with appropriate momentum, etc., can effectively improve the sp3 hybrid film carbon atoms in the content of Raman The structure, mechanical and optical properties, surface morphology and other characteristics of the obtained diamond-like carbon films were analyzed by X-ray photoelectron spectroscopy, nanomechanical probe, infrared spectroscopy and scanning electron microscopy.The results showed that the content of sp3 hybrid carbon atoms in DLC films was high, The microhardness is more than 11GPa, the optical transmittance of the film is 89.4%, the refractive index is 1.952, the deposition rate is 0. 724μm / h, the surface is smooth, dense and uniform, and no obvious grain features exist.