介绍了一种利用磁控溅射制备多层膜速率的定标方法。用高精度磁控溅射镀膜设备在同一块基片上先后镀制了两种周期的多层膜,用X射线衍射仪对其进行掠入射衍射测量,测量数据经线性拟合,可同时求得两种多层膜的周期,进而得到镀膜速率。与常用的定标方法相比,该方法不仅可以得到与常用定标方法相同的实验结果,而且提高了工作效率。 A calibration method for preparing multilayer films by magnetron sputtering is presented. High-precision magnetron sputtering coating equipment on the same piece of substrate has been plated two kinds of periodic multilayer film, with X-ray diffraction grazing incidence diffraction measurement of the measured data by linear fitting can be obtained simultaneously The period of the two multilayer films, and then get the coating rate. Compared with the commonly used calibration methods, this method can not only get the same experimental results as the common calibration methods, but also improve the work efficiency.