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研究了离子镀ＴｉＮ 涂层在５００ ～７００ ℃间的高温氧化特性， 并利用ＳＥＭ 观察和ＸＲＤ 相分析研究了氧化产物的类型及膜失效机制。结果表明， ＴｉＮ 膜的氧化遵循抛物线扩散规律， 其氧化产物为金红石型ＴｉＯ２ 。与Ｍ２ 和３Ｃｒ２ Ｗ８Ｖ 相比， ＴｉＮ 膜具有优良的抗氧化性能。以Ｍ２ 为基体的ＴｉＮ 涂层抗氧化性能略高于以３Ｃｒ２ Ｗ８Ｖ 为基体的ＴｉＮ 涂层
The oxidation characteristics of TiN coating at 500 ~ 700 ℃ were studied. The types of the oxidation products and the mechanism of the film failure were investigated by SEM and XRD. The results show that the oxidation of TiN film follows the rule of parabolic diffusion and its oxidation product is rutile TiO2. Compared with M2 and 3Cr2 W8V, TiN film has excellent oxidation resistance. The oxidation resistance of TiN coating based on M2 is slightly higher than that of TiN coating based on 3Cr2 W8V