【摘 要】
：
Crystalline SiO2(c-SiO2) samples were firstly implanted at room temperature (RT) with 120 keV Cions and then irradiated at RT with 950 MeV Pb ions. The C-ion ir
【机 构】
：
CIRIL BP5133,14070 Caen Cedex 05,France,CIRIL,BP5133,14070 Caen Cedex 05,France,
【出 处】
：
IMP & HIRFL Annual Report
论文部分内容阅读
Crystalline SiO2(c-SiO2) samples were firstly implanted at room temperature (RT) with 120 keV Cions and then irradiated at RT with 950 MeV Pb ions. The C-ion irradiation experiments were performed on the 200 kV heavy ion implanter of IMP and the selected implantation doses are 2. 0×1017 , 5. 0×1017, 8. 6×1017 and 1. 2×1017C/cm2. The Pb ion irradiation was carried out at the IRASME (CIRIL-GANIL, Caen) and the irradiation fluencies are 5.0×1011,1. 0×1012 and 1..0×1012 Pb/cm2 , respectively. The chemical bonds formation in the samples was investigated by using a Spectrum GX IR spectroscopy.
Crystalline SiO2 (c-SiO2) samples were initially implanted at room temperature (RT) with 120 keV Cions and then irradiated at RT with 950 MeV Pb ions. The C-ion experiments experiments performed on the 200 kV heavy ion implanter of IMP and The selected ion doses were 2. 0 × 1017, 5. 0 × 1017, 8. 6 × 1017 and 1. 2 × 1017C / cm2. The Pb ion irradiation was carried out at the IRASME (CIRIL-GANIL, Caen) and the irradiation fluencies are 5.0 × 1011, 1.0 × 1012 and 1..0 × 1012 Pb / cm2, respectively. The chemical bonds formation in the samples was investigated by using a Spectrum GX IR spectroscopy.
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