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总结了几种能大幅度提高沉积速率的方法。分别给出了这几种方法的沉积速率,分析了它们能提高沉积速率的原因,以及所制备的a-Si:H膜的光电性质。
Summarized several methods can greatly improve the deposition rate. The deposition rates of these methods are given respectively. The reason why they can increase the deposition rate and the photoelectric properties of the prepared a-Si: H films are analyzed.