【摘 要】
：
N doped TiO2 films were deposited on glass substrates at room temperature by RF magnetron sputtering with a TiO2 ceramic target.We studied the influences of sputtering power on the deposition rate, ch
【机 构】
：
State Key Laboratory of Advanced Technology for Float Glass, Bengbu Design & Research Institute for
【出 处】
：
The 24th International Conference on Glass( ICG Congress 201
论文部分内容阅读
N doped TiO2 films were deposited on glass substrates at room temperature by RF magnetron sputtering with a TiO2 ceramic target.We studied the influences of sputtering power on the deposition rate, chemical composition, crystal structure and band gap of deposited films by using Optical profiler, X-ray photoelectron spectroscope, X-ray diffractometer, and ultraviolet-visible spectrophotometer.
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