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Modeling of C3F6O/Ar Plasma Chemistry for SiO2 Etching Processes
【作 者】
:
【机 构】
:
Nagoya University,Furo-cho,Chikusa-ku,Nagoya 464-8603,Japan
【出 处】
:
The 8th Asian-European International Conference on Plasma Su
【发表日期】
:
2011年1期
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