【摘 要】
：
In this paper, the laser damage morphology and laser damage threshold of sol-gel thin films were investigated.The laser damage of sol-gel thin film was distinguished in detail.Ring damage, this type o
【机 构】
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Department of Electronic and Electrical Engineering of Nanyang Institute of Technology, Nanyang, Hen
【出 处】
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2016’中国溶胶-凝胶学术研讨会暨国际论坛
论文部分内容阅读
In this paper, the laser damage morphology and laser damage threshold of sol-gel thin films were investigated.The laser damage of sol-gel thin film was distinguished in detail.Ring damage, this type of laser damage threshold high can be up to above 18J/cm2 (1064 nm, 1ns).ZrO2 and ZrO2-PVP, HfO2, HfO2-PVP thin film etc.will appear this type of damage.This situation is closely related to the basic properties of the films preparation method.Defect induced damage, this type of laser damage threshold is low and in 2-15 J/cm2 (1064nm, 1ns).Cellular damage, the laser damage threshold of this type is relatively high.The maximum can reach 18J/cm2 (1064nm, lns) above, such as ZrO2-PVP, HfO2-PVP and so on.Delamination damage, in the laser irradiation, the film will be ablated.The laser damage threshold of this type is in the range of 5-15 J/cm2 (1064rim, lns), such as ZrO2/SiO2, HfO2/SiO2, ZrO2-PVP/SiO2 and other multilayer film prepared by chemical method.Melt damage, the type of laser damage threshold is very high.The highest value can reach 30 J/cm2 (1064nm, 1ns) above, such as the SiO prepared by alkaline catalysis method.
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