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Highly infrared transparent and protective Hafnium Oxynitride (HfOxNy) coatings were deposited on fused quartz and ZnS substrates by reactive magnetron sputtering. Based on the x-ray diffraction, Fourier transform infrared spectroscopy, and x-ray photoelectron spectroscopy results, it was found that HfOxNy crystallization could be weaked with increasing N2 flow ratios at 400 ℃. various N2 flow ratios not only effectively tuned tran mittance at Far infrared wavelength (FIR), but also led to a dramatic improvement in mechanical property. Furthermore, it demonstrated that the tunability mechanism of the IR optical tran mittance in HfOxNy coatings may arise from the shift of point-defect-induced variations between oxygen vacancies and nitrogen vacancies. These high quality HfOxNy coatings with high transparency in FIR spectral range and enhanced mechanism would be suitable for IR window systems.