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5. Numerical study of the Plasma Chemistry in Inductively Coupled SF6 and SF6 /Ar Plasmas Used for Deep

Numerical study of the Plasma Chemistry in Inductively Coupled SF6 and SF6 /Ar Plasmas Used for Deep

来源 :2011年第三届微电子及等离子体技术国际会议 | 被引量 : 0次 | 上传用户：Cgsking

【摘 要】

：

Inductively coupled plasmas (ICPs) produced in SF6 and its mixtures with other gases (Ar,O2,CF4,SiCl4,…) have been widely used for Si etching in a variety of applications,especially for deep trench et

【作 者】

：

Ming Mao Annemie Bogaerts 

【机 构】

：

PLASMANT, Dept. of Chemistry, University of Antwerp, Universiteitsplein 1, B-2610 Antwerp, Belgium

【出 处】

：

2011年第三届微电子及等离子体技术国际会议

【发表日期】

：

2011年9期

【关键词】

：

Plasma simulation SF6 plasma Etching application Hybrid model 

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Inductively coupled plasmas (ICPs) produced in SF6 and its mixtures with other gases (Ar,O2,CF4,SiCl4,…) have been widely used for Si etching in a variety of applications,especially for deep trench etching in micro-electro-mechanical systems.

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