Interface characterization, optical and thermal properties of multilayer mirrors for the EUV domain

来源 :中国物理学会2013年秋季学术会议 | 被引量 : 0次 | 上传用户：mokung1

【摘要】

：

The radiation domain of extreme ultraviolet(EUV)has great potential in science and technology in photolithography,astrophysics,photoelectron spectroscopy,etc..

【作者】

：

M.-H.Hu K.Le Guen J.-M.André P.Jonnard J.-D.Guo

【机构】

：

Beijing National Laboratory for Condensed-Matter Physics and Institute of Physics,Chinese Academy of

【出处】

：

中国物理学会2013年秋季学术会议

【发表日期】

：

2013年11期

【关键词】

：

EUV and X-ray Optics multilayers interfaces surface annealing X-ray Emission Spe

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　　The radiation domain of extreme ultraviolet(EUV)has great potential in science and technology in photolithography,astrophysics,photoelectron spectroscopy,etc..

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Interface characterization, optical and thermal properties of multilayer mirrors for the EUV domain

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