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本文提出的数据表明,在透明介质上按通常工艺抛光的表面上产生损伤所需要的光场,比损伤一个无缺陷表面所需的光场要小,因为电场在缺陷处增强了。文中报导了三种材料在1.06微米时的体损伤场,并发现与无缺陷表面的表面损伤场相同。
The data presented here shows that the light field required to create damage on a transparent substrate by conventional process polishing is smaller than the optical field required to damage a defect-free surface because the electric field is enhanced at the defect. The body damage fields for the three materials at 1.06 microns are reported in the paper and found to be the same as the surface damage fields for defect-free surfaces.