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利用聚苯乙烯胶体微球组装的单层胶体晶体阵列作为掩模板,分别采用反应离子刻蚀和等离子体刻蚀工艺在晶体硅表面构造出不同形态的微纳米结构,并研究不同刻蚀方法和不同刻蚀时间对微结构形态的影响作用。利用分光光度计测试得到微结构表面的反射光谱曲线。结果表明,在0.35~1.1μm太阳光有效吸收波段,单晶硅材料微结构表面的反射率显著降低,由于此时材料的透射率为零,材料在该波段的吸收得到有效增强。同时,具有规则微结构表面的减反射性能比无序微结构表面的减反射性能要更好一些。这为增强单晶硅对太阳能的有效吸收提供了一种简单可行的方法。
Using single-layer colloidal crystal arrays assembled with polystyrene colloidal microspheres as a mask, different morphologies of micro-nano structures were fabricated on the surface of crystalline silicon by reactive ion etching and plasma etching, respectively. Effect of different etching time on microstructure morphology. The curve of the reflection spectrum of the microstructure surface was obtained by spectrophotometer test. The results show that the reflectivity of the monocrystalline silicon microstructure decreases significantly at the effective absorption band of sunlight of 0.35 ~ 1.1μm, and the absorption of the material in this band is effectively enhanced because the transmittance of the material is zero. At the same time, the antireflection properties of surfaces with regular microstructures are better than those of disordered microstructures. This provides a simple and feasible method for enhancing the effective absorption of solar energy by monocrystalline silicon.