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This paper reports that stoichiometric, amorphous, and uniform Er2O3 films are deposited on Si(001) substrates by a radio frequency magnetron sputtering technique. Ellipsometry measurements show that the refractive index of the Er2O3 films is very close to that of a single layer antireflection coating for a solar cell with an air surrounding medium during its working wavelength. For the 90-nm-thick film, the reflectance has a minimum lower than 3% at the wavelength of 600 nm and the weighted average reflectances (400-1000 nm) is 11.6%. The obtained characteristics indicate that Er2O3 films could be a promising candidate for antireflection coatings in solar cells.
This paper reports that stoichiometric, amorphous, and uniform Er2O3 films are deposited on Si (001) substrates by a radio frequency magnetron sputtering technique. Ellipsometry measurements show that refractive index of the Er2O3 films is very close to that of a single layer antireflection coating for a solar cell with an air surrounding medium during its working wavelength. For the 90-nm-thick film, the reflectance has a minimum lower than than 3% at the wavelength of 600 nm and the weighted average reflectances (400-1000 nm) is 11.6%. The resulting characteristics indicate that Er2O3 films could be a promising candidate for antireflection coatings in solar cells.