Effect of Rapid Thermal Annealing On the Properties of BaTiO3 Thin Films On Polycrystalline Ni Subst

来源 :2013年全国博士生学术论坛——电子薄膜与集成器件 | 被引量 : 0次 | 上传用户:humeiyu2009
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  Ferroelectric BaTiO3 (BTO) thin films on polycrystalline nickel (Ni) substrates with good dielectric, ferroelectric, piezoelectric properties and magnetoelectric coupling, show great potential in many applications.However, deposition of oxide thin films on base-metallic substrates generally suffers from the serious oxidation between films and substrates.It is demonstrated that BTO thin films can be successfully deposited on Ni foils by a chemical solution technique named μolymer assisted deposition (PAD).It is found that a rapid thermal annealing (RTA) in oxygen would affect the properties of thin films.Dielectric and ferroelectric properties have been systematically studied.The correlation among the RTA conditions, and leakage current densities was established.Mechanisms of the formation of leakage current and the impact from oxygen vacancies will be discussed.The results suggest that the PAD technique can be utilized on the fabrication of ferroelectric films on base-metallic substrates.
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